Aluminium oxide Al2O3 Targets
oxideAl2O3
Product Details
High Purity Aluminium Oxide Al2O3 Sputtering Targets
Custom High Purity Al2-O3 Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 20" in diameter.
Purity Specifications:
(2N) 99% Aluminum Oxide Sputtering Target
(3N) 99.9% Aluminum Oxide Sputtering Target
(4N) 99.99% Aluminum Oxide Sputtering Target
(5N) 99.999% Aluminum Oxide Sputtering Target
In addition to standard configurations we welcome custom design target requests.