electron-beam exposure system ZBA-20

ZBA20
electron-beam exposure system ZBA-20
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Product Details


Electron-beam exposure system ZBA-20 (Carl-Zeiss-Jena) for generation of primary patterns. ZBA-20 operates on the variable shaped beam and vector scan principle and this concept compared to the Gaussian round beam principle yields a much higher productivity.

ZBA-20 can be used to master masks and reticles for contact, proximity and projection lithography, especially for large-area structures, like IR and nuclear radiation detectors or SAW filters , resonators and sensors or direct exposure of semiconductors wafers, especially to be used in the sub 0.5 micrometer range ( e.g. monolithic microwave integrated circuits).

Summary of Specifications:

Chip size: any size up to 150 mm by 150 mm

position resolution: 0.10 um and minimum line width 0.2 (on chromium mask) and 0.5 um (on wafers).